As DRAM technologies scale to increasingly tighter pitches, the patterning requirements exceed the limits of conventional ...
Until EUV lithography becomes a reality, multiple patterning technologies such as triple litho-etch (LELELE), self-aligned double patterning (SADP), and self-aligned quadruple patterning (SAQP) are ...
Nano-electronics research center imec and Nova Measuring Instruments (Nasdaq: NVMI), a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor ...
August 26, 2014. Today, KLA-Tencor Corp. introduced the WaferSight PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer 9.0 ...
Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...
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