Imec has demonstrated that precise control of gas compositions during post-exposure EUV lithography steps can help in minimizing the required exposure dose, thereby unlocking higher wafer throughput.

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...

Schematic image of the basic steps for creating ordered silicon nanostructures through a mask of polystyrene nanospheres using the nanosphere lithography process ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

Electron beam (e-beam) lithography is a specialized technique for creating the extremely fine patterns required by the modern electronics industry for integrated circuits. These patterns are much ...