Author Dr. R. Russell Rhinehart discusses his new book, Nonlinear Model-Based Control: Using First-Principles Models in Process Control, and explains why nonlinear first-principles models should be ...
At California Institute of Technology, he helped build interdisciplinary research environments Morari helped turn MPC from ...
How self-tuning can support an adaptive control strategy. How Model Reference Adaptive Control can improve adaptability. The different types of MRAC. A certain amount of flexibility is always good to ...
Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay ...
Semiconductor process engineers would love to develop successful process recipes without the guesswork of repeated wafer testing. Unfortunately, developing a successful process can’t be done without ...
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