Customers and ecosystem partners are expanding use of the Calibre® Pattern Matching solution to overcome complex integrated circuit (IC) verification and manufacturing problems. The solution ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

As the complexity of IC designs continues to grow, moving critical checks earlier in the design cycle helps designers identify and resolve issues before they escalate, streamlining the overall ...

To keep up with the growing complexities of IC design, major semiconductor companies are adopting shift-left strategies. For verification, this means pulling much of the work into the physical design ...

Calibre Pattern Matching is an extension to SVRF that simplifies complex rule checks required for advanced IC processes. This white paper discusses the conditions that have created the need for ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...